Measurement of sheath expansion in plasma source ion implantation
- Authors
- Kim, YW; Kim, GH; Han, S; Lee, Y; Cho, J; Rhee, SY
- Issue Date
- 2001-02-02
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- SURFACE & COATINGS TECHNOLOGY, v.136, no.1-3, pp.97 - 101
- Abstract
- In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse. (C) 2001 Published by Elsevier Science B.V. All rights reserved.
- Keywords
- SURFACE MODIFICATION; SURFACE MODIFICATION; plasma source ion implantation; time-dependent sheath; ion wave; Langmuir probe
- ISSN
- 0257-8972
- URI
- https://pubs.kist.re.kr/handle/201004/140714
- DOI
- 10.1016/S0257-8972(00)01035-5
- Appears in Collections:
- KIST Article > 2001
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.