Measurement of sheath expansion in plasma source ion implantation

Authors
Kim, YWKim, GHHan, SLee, YCho, JRhee, SY
Issue Date
2001-02-02
Publisher
ELSEVIER SCIENCE SA
Citation
SURFACE & COATINGS TECHNOLOGY, v.136, no.1-3, pp.97 - 101
Abstract
In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse. (C) 2001 Published by Elsevier Science B.V. All rights reserved.
Keywords
SURFACE MODIFICATION; SURFACE MODIFICATION; plasma source ion implantation; time-dependent sheath; ion wave; Langmuir probe
ISSN
0257-8972
URI
https://pubs.kist.re.kr/handle/201004/140714
DOI
10.1016/S0257-8972(00)01035-5
Appears in Collections:
KIST Article > 2001
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