Photoacid-generating sulfonyloxymaleimide polymers and their application to photoimaging
- Authors
- Ahn, KD; Chung, CM
- Issue Date
- 1999-08
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- MACROMOLECULAR SYMPOSIA, v.142, pp.145 - 157
- Abstract
- Synthesis and properties of photoacid generating polymers based on four sulfonyloxymaleimides (RsOMI), N-(tosyloxy)maleimide (TsOMI), N-(methanesulfonyloxy)maleimide (MsOMI), N-(trifluoromethanesulfonyloxy)maleimide (TfOMI), and N-(10-camphorsulfonyloxy)maleimide (CsOMI) are described. The RsOMI polymers photochemically produce corresponding sulfonic acids (RsOH), TsOH, MsOH, TfOH and 10-camphorsulfonic acid (CSA) which can catalyze deprotection of the acid-labile t-BOC groups in the same polymer chains via a chemical amplification process. The photoacid generating polymers with concurrent acid-labile groups offer great potential for applications in functional transformation and photoimaging.
- Keywords
- SINGLE-COMPONENT RESISTS; CHEMICAL AMPLIFICATION; COPOLYMERS; POLYMERIZATION; CHEMISTRY; SYSTEMS; ROUTE; ACID; SINGLE-COMPONENT RESISTS; CHEMICAL AMPLIFICATION; COPOLYMERS; POLYMERIZATION; CHEMISTRY; SYSTEMS; ROUTE; ACID; photoacid generation; sulfonyloxymaleimide; polymeric photoacid generator; photoimaging; chemical amplification; photopolymers; photoresist
- ISSN
- 1022-1360
- URI
- https://pubs.kist.re.kr/handle/201004/142030
- DOI
- 10.1002/masy.19991420115
- Appears in Collections:
- KIST Article > Others
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