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Reactive ion etching characteristics of permalloy thin films

Authors

김성동; 이정중; 임상호; 김희중

Issue Date

1999-01

Citation

日本應用磁氣學會誌 = Journal of the magnetics society of Japan, v.23, no.1-2, pp.252 - 254

Keywords

reactive ion etching; permalloy thin films; etching rate; etching damage; coercivity

ISSN

0285-0192

URI

https://pubs.kist.re.kr/handle/201004/142512

Appears in Collections:

KIST Article > Others

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