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Kinetics of chemical vapor deposition of silicon on Ni substrate from a gas mixture of SiCl4 and H2

Other Titles

SiCl4-H2 반응가스에 의한 Ni 기판위에서 Si의 화학증착속도론

Authors

윤진국; 유재은; 맹선재; 정병성; 김재수; 최종술

Issue Date

1998-10

Publisher

대한금속학회

Citation

대한금속학회지, v.36, no.10, pp.1655 - 1662

Keywords

kinetics

URI

https://pubs.kist.re.kr/handle/201004/142807

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KIST Article > Others

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