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New alicyclic polymers based on protected dinorbornene monomers for application as deep UV resists

Authors: Ahn, K.-D.; Rang, J.-H.; Lee, C.-W.; Kim, J.-M.; Han, D.-K.; Lee, J.-H.; Cho, I.; Moon, S.-Y.; Koo, J.-S.; Lee, S.-K.

Issue Date: 1998-01

Publisher: Tokai University

Citation: Journal of Photopolymer Science and Technology, v.11, no.3, pp.499 - 504

Abstract: [No abstract available]

Keywords: Alicyclic polymers; Arf resist; Protected dinorbornene polymers

ISSN: 0914-9244

URI: https://pubs.kist.re.kr/handle/201004/143443

DOI: 10.2494/photopolymer.11.499

Appears in Collections:: KIST Article > Others

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