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Effects on the oxidation rate with silicon orientation and its surface morphology

Other Titles

실리콘배향에 따른 산화 속도 영향과 표면 Morphology

Authors

전법주; 오인환; 임태훈; 정일현

Issue Date

1997-06

Publisher

한국공업화학회

Citation

Journal of the Korean Industrial and Engineering Chemistry = 공업화학, v.8, no.3, pp.395 - 402

Keywords

ECRCVD; a-Si:H; silicon orientation; surface morphology

ISSN

1225-0112

URI

https://pubs.kist.re.kr/handle/201004/143759

Appears in Collections:

KIST Article > Others

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