Terahertz waveguide components fabricated using a 3D x-ray microfabrication technique

Authors
Moon, SWMann, CMMaddison, BJTurcu, ICEAllot, RHuq, SELisi, N
Issue Date
1996-09-12
Publisher
IEE-INST ELEC ENG
Citation
ELECTRONICS LETTERS, v.32, no.19, pp.1794 - 1795
Abstract
A novel process using embedded x-ray masks that allows the fabrication of 3D terahertz waveguide components is demonstrated. X-rays produced by a laser plasma source are used to expose a chenically amplified resist. To produce structures with the required depth (similar to 50 mu m) a cyclic exposure and development technique is used. A representative waveguide cavity intended for operation at 2.5THz is realised.
Keywords
x-ray lithography; optical waveguides; waveguides
ISSN
0013-5194
URI
https://pubs.kist.re.kr/handle/201004/144306
DOI
10.1049/el:19961166
Appears in Collections:
KIST Article > Others
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