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Post-growth annealing effects of low-temperature grown TiO//2 thin films on InP substrate by low-pressure metalorganic chemical vapor deposition.

Authors

김은규; 민석기; 염상섭; 손맹호; 한영기; 왕채현

Issue Date

1996-04

Citation

J. appl. phys., v.v. 79, no.no. 8, pp.4459 - 4461

Keywords

post-growth annealing

URI

https://pubs.kist.re.kr/handle/201004/144483

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KIST Article > Others

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