Cu films on Si(100) by partially ionized beam deposition

Other Titles
부분 이온빔 증착법으로 제작한 silicon(100) 기판위의 구리 박막
Authors
장홍규김기환최성창최두진최원국손용배고석근정형진
Issue Date
1996-01
Citation
J. ISHM-Korea, The microelectronics society, v.3, no.2, pp.17 - ?
URI
https://pubs.kist.re.kr/handle/201004/144738
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE