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100 ㎚ electron beam lithography using a modified scanning electron microscope.

Authors

김성일; 민석기; 김은규; 최범호; 황성우; 정석구; 김태근

Issue Date

1996-01

Citation

Bulletin of the Korean physical society, v.v. 14, no.no. 2, pp.539 - ?

Keywords

MOCVD

URI

https://pubs.kist.re.kr/handle/201004/144760

Appears in Collections:

KIST Article > Others

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