Dependences of PbTiO//3 thin films on Ti bath temperature and deposition temperature.

Other Titles
MOCVD 법에 의한 Ti bath 온도와 기판온도 변화에 따른 박막의 증착특성 =
Authors
염상섭한영기D. J. Choi왕채현
Issue Date
1996-01
Citation
요업학회지 = Journal of the Korean ceramic society, v.v. 33, no.no. 4, pp.371 - 378
Keywords
thin films
URI
https://pubs.kist.re.kr/handle/201004/144818
Appears in Collections:
KIST Article > Others
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