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2-TEMPERATURE TECHNIQUE FOR PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION GROWTH OF SILICON-NITRIDE ON INP

Authors

HER, J; LIM, H; KIM, CH; HAN, IK; LEE, JI; KANG, KN; KIM, JE; PARK, HY

Issue Date

1994-06-15

Publisher

CHAPMAN HALL LTD

Citation

JOURNAL OF MATERIALS SCIENCE LETTERS, v.13, no.12, pp.898 - 900

Keywords

silicon-nitride on InP

ISSN

0261-8028

URI

https://pubs.kist.re.kr/handle/201004/145554

DOI

10.1007/BF00273243

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KIST Article > Others

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