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Preparation of large area TiO2 thin films by low pressure chemical vapor deposition

Authors

박달근; 전병수; 이중기; 신세희

Issue Date

1994-01

Citation

한국재료학회지, v.24, no.8, pp.861 - 869

Keywords

CVD; titanium dioxide; thin film

URI

https://pubs.kist.re.kr/handle/201004/145728

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KIST Article > Others

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