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Synthesis of H//2-permselective silica films by chemical vapor deposition.

Other Titles

화학증착 (CVD) 에 의한 선택적 수소 투과성 실리카막의 제조 =

Authors

하흥용; 홍성안; 남석우

Issue Date

1992-01

Citation

멤브레인 = Membrane journal, v.v. 2, no.no. 1, pp.21 - 32

Keywords

H//2 selectivity; silica membrane; chemical vapor deposition

URI

https://pubs.kist.re.kr/handle/201004/146504

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KIST Article > Others

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