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Observation of oxide film formed at Si-Si bonding interface in SFB process

Other Titles

SFB 공정시 Si-Si 접합 계면에 형성되는 산화막의 관찰

Authors

주병권; 오명환; 차균현

Issue Date

1992-01

Citation

전자공학회논문지, v.29A, no.1, pp.41 - 47

Keywords

micromachining; wafer direct bonding; interfacial oxide

URI

https://pubs.kist.re.kr/handle/201004/146566

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KIST Article > Others

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