저압 MOCVD 에 의한 GaAs 에피층의 Carbon 도핑특성 .

Authors
김용김성일민석기엄경숙김무성곽병현마동성
Issue Date
1992-01
Citation
응용물리, v.v. 5, no.no. 12, pp.586 - 590
Keywords
저압 MOCVD; GaAs; carbon-doping
URI
https://pubs.kist.re.kr/handle/201004/146667
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE