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HEATING EFFECT IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE

Authors

HAN, IK; LEE, YJ; JO, JH; LEE, JI; KANG, KN

Issue Date

1991-05-01

Publisher

CHAPMAN HALL LTD

Citation

JOURNAL OF MATERIALS SCIENCE LETTERS, v.10, no.9, pp.526 - 528

Keywords

FILMS; FILMS

ISSN

0261-8028

URI

https://pubs.kist.re.kr/handle/201004/146796

DOI

10.1007/BF00726926

Appears in Collections:

KIST Article > Others

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