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Plasma enhanced chemical vapor deposition of low-resistive tungsten thin films.

Authors

김용태; 민석기; 홍종성; 김충기

Issue Date

1991-01

Citation

Appl. phys. lett., v.v. 58, pp.837 - 839

URI

https://pubs.kist.re.kr/handle/201004/146861

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KIST Article > Others

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