A study on the interface states and capacitance-voltage behavior of InP MIS diode fabricated by plasma assisted oxidation.

Other Titles
원격 플라즈마 산화법에 의해 제작된 InP MIS 다이오드의 C-V 특성 및 계면상태에 관한 연구 =
Authors
강광남이정일이명복임한조J. A. BaglioN. Decola
Issue Date
1991-01
Citation
새물리, v.v. 31, no.no. 3, pp.296 - ?
Keywords
InP MIS 다이오드
URI
https://pubs.kist.re.kr/handle/201004/146910
Appears in Collections:
KIST Article > Others
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