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Chemical modification of PMIPK resist.

Authors

안광덕

Issue Date

1990-01

Citation

Polymers for microelectronics-science and technology, pp.269 - 281

Keywords

poly(methyl isopropenyl ketone) [PMIPK]; PMIPK-oxime; photosensitizer; photosensitivity; photodegradation; side-chain modification; polymer reaction; photoresist

URI

https://pubs.kist.re.kr/handle/201004/147187

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KIST Article > Others

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