Chemical modification of PMIPK resist.
- Authors
- 안광덕
- Issue Date
- 1990-01
- Citation
- Polymers for microelectronics-science and technology, pp.269 - 281
- Keywords
- poly(methyl isopropenyl ketone) [PMIPK]; PMIPK-oxime; photosensitizer; photosensitivity; photodegradation; side-chain modification; polymer reaction; photoresist
- URI
- https://pubs.kist.re.kr/handle/201004/147187
- Appears in Collections:
- KIST Article > Others
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