Chemical modification of PMIPK resist.

Authors
안광덕
Issue Date
1990-01
Citation
Polymers for microelectronics-science and technology, pp.269 - 281
Keywords
poly(methyl isopropenyl ketone) [PMIPK]; PMIPK-oxime; photosensitizer; photosensitivity; photodegradation; side-chain modification; polymer reaction; photoresist
URI
https://pubs.kist.re.kr/handle/201004/147187
Appears in Collections:
KIST Article > Others
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