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Microwave plasma enhanced chemical vapor deposition of silicon nitride films.

Authors

김용태; 김춘근; 민석기

Issue Date

1989-01

Publisher

Korean Physical Society

Citation

Journal of the Korean Physical Society, v.22, pp.197 - 202

ISSN

0374-4884

URI

https://pubs.kist.re.kr/handle/201004/147433

Appears in Collections:

KIST Article > Others

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