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Effects of annealing temperature on microstructure and electrical and optical properties of radio-frequency-sputtered tin-doped indium oxid thin films.

Authors

나종갑; Y. R. Cho; Y. H. Kim; T. D. Lee; S. J. Park

Issue Date

1989-01

Citation

J. Am. ceram. soc., v.v. 72, no.no. 4, pp.698 - 701

Keywords

indium oxide; sputtering; electrical property; optical property

URI

https://pubs.kist.re.kr/handle/201004/147444

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KIST Article > Others

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