(100) 실리콘 기판위에 MOCVD 법으로 성장된 GaAs 에피층의 결정구조 특성 .

Authors
김용김무성김현수민석기
Issue Date
1988-07
Citation
응용물리, v.v. 1, pp.121 - ?
Keywords
X-ray diffraction; GaAs-on-Si; MOCVD
URI
https://pubs.kist.re.kr/handle/201004/147561
Appears in Collections:
KIST Article > Others
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