KIST Library Institutional Repository

The effects of residual oxide layers formed after chemical etching on the electrical characteristics of Al/GaAs schottky barrier.

Other Titles

화학식각된 계면산화막이 Al/GaAs schottky barrier 의 전기적 특성에 미치는 효과 =

Authors

강광남; 이명복; 이정일

Issue Date

1988-01

Citation

새물리, v.v. 25, no.no. 3, pp.349 - ?

Keywords

schottky barrier

URI

https://pubs.kist.re.kr/handle/201004/147679

Appears in Collections:

KIST Article > Others

Export

RIS (EndNote)

XLS (Excel)

XML