Thermally stable, deep UV resist materials.

Authors
안광덕S. R. TurnerC. G. Willson
Issue Date
1987-01
Citation
Polymers for high technology - electronics and photonics : ACS symposium series, v.v. 346, pp.200 - 210
URI
https://pubs.kist.re.kr/handle/201004/147809
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE