Browsing byAuthorChung, Yoon Jang
Showing results 1 to 17 of 17
| Issue Date | Title | Author(s) |
|---|---|---|
| 2024-08 | A Hybrid Biofuel Cell with High Power and Operational Stability Using Electron Transfer-Intensified Mediators and Multi-Interaction Assembly | Jang, Younjun; Seo, Tae-Won; Pak, Junha; Park, Moon Kyu; Ahn, Jeongyeon; Jin, Gee Chan; Lee, Seung Woo; Chung, Yoon Jang; Choi, Young-Bong; Kwon, Cheong Hoon; Cho, Jinhan |
| 2023-12 | A Mediator-Free Multi-Ply Biofuel Cell Using an Interfacial Assembly between Hydrophilic Enzymes and Hydrophobic Conductive Oxide Nanoparticles with Pointed Apexes | Kang, Minchul; Nam, Donghyeon; Ahn, Jeongyeon; Chung, Yoon Jang; Lee, Seung Woo; Choi, Young-Bong; Kwon, Cheong Hoon; Cho, Jinhan |
| 2024-07 | Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering | Kim, Taikyu; Jeon, Jihoon; Ryu, Seung Ho; Chung, Hong Keun; Jang, Myoungsu; Lee, Seunghyeok; Chung, Yoon Jang; Kim, Seong Keun |
| 2024-02 | Emerging Challenges in Textile Energy Electrodes: Interfacial Engineering for High-Performance Next-Generation Flexible Energy Storage Devices | Chang, Woojae; Yong, Euiju; Chung, Yoon Jang; Ko, Yongmin; Cho, Jinhan |
| 2014-11-11 | Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O | Han, Jeong Hwan; Chung, Yoon Jang; Park, Bo Keun; Kim, Seong Keun; Kim, Hyo-Suk; Kim, Chang Gyoun; Chung, Taek-Mo |
| 2024-04 | High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance | Jeon, Jihoon; Kim, Taikyu; Jang, Myoungsu; Chung, Hong Keun; Kim, Sung-Chul; Won, Sung Ok; Park, Yongjoo; Choi, Byung Joon; Chung, Yoon Jang; Kim, Seong Keun |
| 2024-08 | Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm | Chung, Hong Keun; Jeon, Jihoon; Kim, Han; Jang, Myoungsu; Kim, Sung-Chul; Won, Sung Ok; Baek, In-Hwan; Chung, Yoon Jang; Han, Jeong Hwan; Cho, Sung Haeng; Park, Tae Joo; Kim, Seong Keun |
| 2023-07 | Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition | Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun |
| 2012-12 | Performance Variation According to Device Structure and the Source/Drain Metal Electrode of a-IGZO TFTs | Rha, Sang Ho; Jung, Jisim; Jung, Yoonsoo; Chung, Yoon Jang; Kim, Un Ki; Hwang, Eun Suk; Park, Byoung Keon; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2012-01 | Properties of Atomic Layer Deposited HfO2 Films on Ge Substrates Depending on Process Temperatures | Jung, Hyung-Suk; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Park, Jinho; Jang, Jae Hyuck; Jeon, Sang-Ho; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2012-09 | Reduction of Charge Trapping in HfO2 Film on Ge Substrates by Atomic Layer Deposition of Various Passivating Interfacial Layers | Jung, Hyung-Suk; Yu, Il-Hyuk; Kim, Hyo Kyeom; Lee, Sang Young; Lee, Joohwi; Choi, Yujin; Chung, Yoon Jang; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2013-10 | Study on the defects in metal-organic chemical vapor deposited zinc tin oxide thin films using negative bias illumination stability analysis | Kim, Un Ki; Rha, Sang Ho; Kim, Jeong Hwan; Chung, Yoon Jang; Jung, Jisim; Hwang, Eun Suk; Lee, Joohwi; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2012-04-30 | The charge trapping characteristics of Si3N4 and Al2O3 layers on amorphous-indium-gallium-zinc oxide thin films for memory application | Jung, Ji Sim; Rha, Sang-Ho; Kim, Un Ki; Chung, Yoon Jang; Jung, Yoon Soo; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2013-03 | The Electrical Properties of Asymmetric Schottky Contact Thin-Film Transistors with Amorphous-In2Ga2ZnO7 | Rha, Sang Ho; Kim, Un Ki; Jung, Jisim; Kim, Hyo Kyeom; Jung, Yoon Soo; Hwang, Eun Suk; Chung, Yoon Jang; Lee, Mijung; Choi, Jung-Hae; Hwang, Cheol Seong |
| 2012-07 | The Impact of Carbon Concentration on the Crystalline Phase and Dielectric Constant of Atomic Layer Deposited HfO2 Films on Ge Substrate | Jung, Hyung-Suk; Jeon, Sang Ho; Kim, Hyo Kyeom; Yu, Il-Hyuk; Lee, Sang Young; Lee, Joohwi; Chung, Yoon Jang; Cho, Deok-Yong; Lee, Nae-In; Park, Tae Joo; Choi, Jung-Hae; Han, Seungwu; Hwang, Cheol Seong |
| 2024-04 | Unlocking the Potential of Porous Bi2Te3-Based Thermoelectrics Using Precise Interface Engineering through Atomic Layer Deposition | Lee, Seunghyeok; Park, Gwang Min; Kim, Younghoon; Lee, So-Hyeon; Jung, Sung-Jin; Hong, Junpyo; Kim, Sung-Chul; Won, Sung Ok; Lee, Albert S.; Chung, Yoon Jang; Kim, Ju-Young; Kim, Heesuk; Baek, Seung-Hyub; Kim, Jin-Sang; Park, Tae Joo; Kim, Seong Keun |
| 2012-05-14 | Vertically integrated submicron amorphous-In2Ga2ZnO7 thin film transistor using a low temperature process | Rha, Sang Ho; Jung, Jisim; Jung, Yoon Soo; Chung, Yoon Jang; Kim, Un Ki; Hwang, Eun Suk; Park, Byoung Keon; Park, Tae Joo; Choi, Jung-Hae; Hwang, Cheol Seong |
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