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Showing results 1 to 6 of 6

Issue DateTitleAuthor(s)
-Characteristics of Pulse Plasma Atomic Layer Deposited W-C-N Diffusion Barrier for Cu InterconnectKim, Yong Tae; Hyun Sang Sim; Park Ji Ho
-Characteristics of W-C-N thin film as a new diffusion barrier for Cu interconnectionChang Woo Lee; Kim, Yong Tae; Park Ji Ho; Hee Joon Kim
-Electrical Properties of Field Effect Transistor with (Bi,La)Ti3O12 Ferroelectric Gate Film on Y2O3/Si SubstrateHo Jung Chang; Kang Mo Suh; Park Ji Ho; Ho Sung Chang; Soon Chan Hong; Kim, Yong Tae; Makoto Ishida
-Improvement of W-N films Using WF6 Pulse Plasma Atomic Layer DepositionHyun Sang Sim; Park Ji Ho; Kim, Seong Il; Kim, Yong Tae
2020-08-18고전도성 탄소나노튜브 섬유 제조 및 이를 이용한 3차원 구조화Lee Dong Ju; Park Ji Ho; Kim Seo Gyun; Kim, Nam Dong; Bon-Cheol Ku
-(Undefined)Kim, Yong Tae; Park Ji Ho; 김희준; 이창우
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