- | Low temperature crystallization of SBT and YMO ferroelectric films by excimer laser irradiation | H. Hiramatsu; T. ITO; Y. Ohki; 설광수; 최인훈; Kim Yong Tae |
- | Low temperature crystallization of SBT and YMO ferroelectric films by excimer laser irradiation | H. Hiramatsu; T. ITO; Y. Ohki; 설광수; 최인훈; Kim Yong Tae |
- | Low temperature crystallization of SrBi2Ta2O9 film by excimer laser irradiation | 설광수; Y. Ohki; H. Hiramatsu; 신동석; 최인훈; Kim Yong Tae |
1995-01 | New concept for amorphous diffusion barrier: Ion beam modification of metal/semiconductor interface. | Kim Yong Tae; S. K. Kwak; C. S. Kwon; D. J. Kim; C. W. Lee; I. H. Choi; Min Suk-Ki |
1996-01 | Nitrogen effects of Ta-Si-N diffusion barrier in Si/Cu metallization. | Kim Yong Tae; S. P. Jeong; D. J. Kim; J. W. Park; Min Suk-Ki |
1994-01 | Nitrogen implanted tungsten thin films for Cu diffusion barrier. | Kim Yong Tae; D. J. Kim; C. S. Kwon; I. H. Choi; Min Suk-Ki |
1995-01 | Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization. | Kim Yong Tae; 이창우 |
- | Optical constants of AlGaN grown by molecular beam epitaxy | Jewon Kim; SON CHANG-SIK; 최인훈; PARK YOUNG KYUN; Kim Yong Tae; O. Ambacher; M. Stutzmann |
- | Optical properties of AlxGa1-xN grown by plasma induced molecular beam epitaxy | Jewon Kim; SON CHANG-SIK; 최인훈; PARK YOUNG KYUN; Kim Yong Tae |
- | Performance of plasma deposited tungsten nitride diffusion barrier for Al and Au metallizations. | Kim Yong Tae; 이창우; Min Suk-Ki |
- | Photothermal deflection spectroscopy on InGaN/GaN heterostructures | Jewon Kim; PARK YOUNG KYUN; Kim Yong Tae; SON CHANG-SIK; 최인훈; O. Ambacher; M. Stutzmann |
1994-01 | Post annealing characteristics of RF magnetron sputtered PbTiO//3 films. | Kim Yong Tae; H. N. Lee; J. G. Lee; C. S. Kwon; S. H. Choh; Min Suk-Ki |
- | Pulse plasma enhanced atomic layer deposition of tungsten nitride thin film | Kim Yong Tae |
- | Pulsed excimer laser annealing effects of ion implanted silicon on insulator. | Kim Seong Il; Min Suk-Ki; KIM EUN KYU; Kim Yong Tae; KIM CHUN KEUN; KIM MOO SUNG |
- | Relationships among coercive voltage, memory window and electric distribution in ferroelectric gate structure | Sung-Kyun Lee; Kim Yong Tae; Kim Seong Il; 이철의 |
- | Reliability of Cu/W-N thin films deposited on low dielectric constant SiO:F ILD | 이석형; 김동준; 양성훈; 박정원; 손세일; 오경희; Kim Yong Tae; 박종완 |
- | Structural and electrical characteristics of ZrO ₂ as a gate dielectric and buffer layer grown by RF magnetron sputtering | 임근식; 최훈상; 이종한; Kim Yong Tae; Kim Seong Il; 최인훈 |
- | Structural and micromechanical characteristics of low-dielectric organosilicate thin films modified by NH₃ plasma treatment | 차국헌; 주상현; 김수한; 심현상; Kim Yong Tae; 한진희; 이진규; 윤도영 |
1996-01 | Study of temperature dependent conductivity of Ta, Ta-Si-N thin films. | Kim Yong Tae; S. P. Jeong; D. J. Kim; H. N. Lee; Min Suk-Ki |
- | Study on physical properties of Cu-CVD for ULSI interconnects. | Kim Yong Tae; Y. S. Kim; S. K. Kwak; C. S. Kwon; D. G. Jung; Min Suk-Ki |
- | The changes of the properties of Pt/SrBi2Ta2O9/Pt capacitors and Pt/SrBi2Ta2O9/CeO2/Si structures by post-annealing and their origin | 신동석; 최훈상; Ho Nyung Lee; Kim Yong Tae; PARK YOUNG KYUN; 최인훈 |
- | The effects of process conditions on the prperties of SiN film in PECVD process. | Kim Yong Tae; C. W. Nam; S. I. Woo |
- | The effects of various bottom electrodes in MFM structure on the ferroelectric properties of SrBi2Nb2O9 thin films using RF magnetron sputtering | 최훈상; 이종한; 임건식; 강민정; 최인훈; Kim Yong Tae; Kim Seong Il |
- | The present status and outlook of nano technology | Kim Yong Tae |
- | The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization. | Kim Yong Tae; C. S. Kwon; D. J. Kim; J. Y. Lee; I. H. Choi |
- | Thermal stability of plasma deposited tungsten nitride thin films for VLSI devices. | Kim Yong Tae; 이창우; 권철순 |
- | Top electrode annealing effects in Pt/SrBi//2Ta//2O//9/CeO//2/Si structure | 신동석; Kim Yong Tae; 최인훈; 조성호 |
- | UV-cured blend polymer electrolytes for lithium polymer battery | Kim Yong Tae; 송민규; Cho Byung Won; Yun Kyung Suk; 이희우 |
- | 질소이온 주입된 질화텅스텐박막의 구리배선용 확산방지막 특성 . | Kim Yong Tae; 권철순; 김동준; Min Suk-Ki |
- | (Undefined) | 최훈상; 조금석; Kim Yong Tae; 이관; 이종한; Kim Seong Il; 최인훈 |